Zirconia Slurry

High performance zirconia lapping and polishing slurry for precision finishing of ceramic, optical and semiconductor materials, delivering ultra-smooth low-damage surface finish.

Leading Polishing Industry Solution Provider

Zirconia Slurry

Zirconia Slurry

Product Overview

Our zirconia slurry is a high-performance precision polishing medium made of high-purity tetragonal zirconia particles, featuring high toughness, good wear resistance and excellent chemical stability. It is formulated with advanced dispersion technology to ensure uniform particle size distribution and excellent suspension stability, suitable for various precision lapping and polishing processes of ceramic materials, optical glass, metals and semiconductor components, providing consistent polishing quality with ultra-low surface damage.

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APPLICATION

Ceramic Component Manufacturing Optical Glass Processing Semiconductor Substrate Finishing Metal Surface Polishing Precision Instrument Production Medical Device Manufacturing Aerospace Component Processing

Product Features

Excellent Polishing Performance
Provides uniform cutting, high polishing efficiency, effectively improves surface roughness, and enhances workpiece smoothness.

Water-Based, Environmentally Friendly System
Water-based formula, environmentally friendly and non-corrosive, safe to use, friendly to both the environment and equipment.

Strong Process Adaptability
Process-friendly, can be diluted for use according to processing requirements, adaptable to various polishing procedures.

Good Stability
Uniform dispersion, stable performance during use, ensuring consistent polishing results.

Controllable Source Quality
Direct supply from the source factory with a complete production and quality control system, ensuring reliable and consistent product quality.


 


Storage Conditions & Methods

Temperature: 0°C ~ 35°C. Protect from freezing (below 0°C, prone to clumping and failure) and from high temperatures (above 35°C, prone to degradation).


Before use: Must be shaken well to prevent abrasive sedimentation that may cause uneven concentration, ensuring stable polishing performance.

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CASES

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